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English(EN) China startup demoes prototype EUV light source

中国初创公司演示采用国产组件的EUV光源原型

中国初创公司朗道思科(Langdao Silex)已演示了极紫外(EUV)光源原型,这是先进半导体制造的关键组件。该系统拥有超过15W的输出功率,并使用了约90%的国产组件。尽管作为原型令人印象深刻,但该技术距离大规模芯片生产的商业可行性仍有数年时间,该公司目标是在三到五年内实现商业化。 AI

影响 EUV光源技术的这一发展可能最终影响未来AI硬件的制造能力,尽管目前距离可行性还有数年时间。

排序理由 该项目报道了一家初创公司对原型技术的演示,这属于研究级别的开发,而非商业产品发布或重大的行业转变。[lever_c_demoted from research: ic=1 ai=0.4]

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中国初创公司演示采用国产组件的EUV光源原型

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该项目报道了一家初创公司对原型技术的演示,这属于研究级别的开发,而非商业产品发布或重大的行业转变。[lever_c_demoted from research: ic=1 ai=0.4]
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报道来源 [1]

  1. Tom's Hardware TIER_1 English(EN) · Anton Shilov ·

    中国初创公司演示原型EUV光源

    Chinese startup Langdao Silex showcased its laser-produced plasma EUV source at a trade show, but the technology will likely take many years before it gets to decent EUV power levels. Even if it does, China will need many more advancements to build a practical EUV lithography too…