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English(EN) TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use TSMC discloses plans to use High-NA EUV lithography in 2030

台积电将于2030年采用High-NA EUV光刻技术

台积电已宣布计划从2030年开始将其High-NA EUV光刻技术整合到其制造流程中。这项先进技术能够实现更高的分辨率,最初将使用传统的6x6英寸光掩模,并计划于2033年过渡到6x12英寸光掩模。该公司预计其A10或A11工艺节点将率先利用这项新技术来制造关键层,旨在满足日益复杂的晶体管架构和对更先进芯片的需求。 AI

影响 这项光刻技术的进步对于未来制造日益复杂的AI加速器和芯片至关重要。

排序理由 台积电宣布将在特定年份采用一项新的、先进的光刻技术用于大规模生产。

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台积电将于2030年采用High-NA EUV光刻技术

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台积电宣布将在特定年份采用一项新的、先进的光刻技术用于大规模生产。
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报道来源 [3]

  1. Tom's Hardware TIER_1 English(EN) · Anton Shilov ·

    台积电将于2030年开始使用高数值孔径极紫外光刻技术——A10或A11技术是主要候选技术

    TSMC discloses plans to use High-NA EUV lithography in 2030, 6×12-inch photomasks with new scanners in 2033.

  2. Mastodon — mastodon.social TIER_1 English(EN) · [email protected] ·

    Pusheen的首款游戏将登陆 Apple Arcade Pusheen 的首款游戏即将推出,并将独家登陆 Apple Arcade。将于 10 月 1 日推出,Pusheen

    Pusheen’s first game is coming to Apple Arcade Pusheen is getting her first game, and it will appear exclusively on Apple Arcade. Launching October 1st, Pusheen's Place lets you collect and care for more than 100 Pusheens as you play minigames and decorate rooms for… https://www.…

  3. Mastodon — mastodon.social TIER_1 English(EN) · [email protected] ·

    台积电2030年开始使用高数值孔径EUV光刻技术 — A10或A11技术是首选,台积电披露2030年使用高数值孔径EUV光刻技术的计划

    TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use TSMC discloses plans to use High-NA EUV lithography in 2030, 6×12-inch photomasks with new scanners in 2033. https://www. tomshardware.com/tech-industry /semiconductors/tsmc-to-st…