English(EN) Gradient-based inverse lithography for EUV masks via the waveguide method and a physics-informed neural operator

AI驱动的逆向光刻技术推动EUV掩模设计

作者 PulseAugur 编辑部 · [2 个来源] · 2026-06-24 12:22

研究人员开发了一种用于极紫外（EUV）掩模的基于梯度的方法逆向光刻技术（ILT）。该新框架集成了可微分的波导方法和波导神经网络算子（WGNO），以重建掩模的吸收体介电常数。数值模拟表明，该方法能够成功生成能够实现晶圆上所需场图案的掩模结构。 AI

影响这项研究可能带来更精确、更高效的先进半导体元件制造。

排序理由详细介绍特定科学领域新方法的学术论文。[lever_c_demoted from research: ic=1 ai=0.7]

AI 生成摘要 · Google Gemini · 来自 2 个来源。我们如何撰写摘要 →

报道来源 [2]

arXiv cs.LG TIER_1 English(EN) · Vasiliy A. Es'kin, Egor V. Ivanov · 2026-06-25 04:00

Gradient-based inverse lithography for EUV masks via the waveguide method and a physics-informed neural operator

arXiv:2606.25753v1 Announce Type: new Abstract: Gradient-based inverse lithography technology~(ILT) for extreme ultraviolet~(EUV) masks is presented. A novel framework treats the differentiable waveguide method and the recently proposed waveguide neural operator~(WGNO) as end-to-…
arXiv cs.AI TIER_1 English(EN) · Egor V. Ivanov · 2026-06-24 12:22

Gradient-based inverse lithography for EUV masks via the waveguide method and a physics-informed neural operator

Gradient-based inverse lithography technology~(ILT) for extreme ultraviolet~(EUV) masks is presented. A novel framework treats the differentiable waveguide method and the recently proposed waveguide neural operator~(WGNO) as end-to-end physics engines, recovering the permittivity…