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English(EN) Global-in-time Spectral Duhamel-Picard Method for Post-Exposure Bake Simulation and Physics-Informed Neural Operators for EUV Lithography

新的谱方法利用神经网络算子加速EUV光刻模拟

研究人员开发了一种新颖的全局时间谱Duhamel-Picard方法,用于模拟极紫外光刻中的光刻后烘烤(PEB)过程。该方法将反应扩散方程重新表述为非线性Volterra积分方程,使用多项式展开来表示完整轨迹,并通过加速Picard迭代确定系数,从而避免了顺序时间推进。该方法已证明能够有效地模拟大型3D域,在大约一分钟内完成$1200\times1200\times100$体素的模拟。此外,该公式已集成到使用因子化傅里叶神经网络算子的物理信息神经网络算子(PINO)中,能够在烘烤区间内的任何时间点进行无时间推进的浓度场预测,而无需预先计算的解。 AI

影响 加速了关键半导体制造过程的模拟时间,有可能加快芯片设计和生产周期。

排序理由 该集群包含一篇详细介绍特定科学应用新计算方法的学术论文。[lever_c_demoted from research: ic=1 ai=1.0]

在 arXiv cs.LG 阅读 →

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新的谱方法利用神经网络算子加速EUV光刻模拟

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该集群包含一篇详细介绍特定科学应用新计算方法的学术论文。[lever_c_demoted from research: ic=1 ai=1.0]
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报道来源 [1]

  1. arXiv cs.LG TIER_1 English(EN) · Doyun Kim, Mircea Dusa, Werner Gilijns, Philippe Leray ·

    用于 EUV 光刻后曝光烘烤模拟和物理信息神经网络算子的全球时域谱 Duhamel-Picard 方法

    arXiv:2610.20655v1 Announce Type: cross Abstract: We present a global-in-time spectral Duhamel-Picard method with polynomial expansions for post-exposure bake (PEB) simulation. The coupled acid-quencher reaction-diffusion equations are reformulated as nonlinear Volterra integral …