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TSMC to adopt High-NA EUV lithography in 2030

By PulseAugur Editorial · [3 sources] ·

TSMC has announced plans to integrate High-NA EUV lithography into its manufacturing processes starting in 2030. This advanced technology, capable of higher resolution, will initially use conventional 6x6-inch photomasks, with a transition to 6x12-inch masks planned for 2033. The company anticipates that its A10 or A11 process nodes will be the first to utilize this new lithography for critical layers, aiming to meet the increasing complexity of transistor architectures and the demand for more advanced chips. AI

IMPACT This advancement in lithography technology is crucial for the future manufacturing of increasingly complex AI accelerators and chips.

RANK_REASON TSMC's announcement of adopting a new, advanced lithography technology for high-volume manufacturing in a specific year.

Read on Mastodon — mastodon.social →

AI-generated summary · Google Gemini · from 3 sources. How we write summaries →

TSMC to adopt High-NA EUV lithography in 2030

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Significant
TSMC's announcement of adopting a new, advanced lithography technology for high-volume manufacturing in a specific year.
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3 independent sources
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59 days old
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COVERAGE [3]

  1. Tom's Hardware TIER_1 English(EN) · Anton Shilov ·

    TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use

    TSMC discloses plans to use High-NA EUV lithography in 2030, 6×12-inch photomasks with new scanners in 2033.

  2. Mastodon — mastodon.social TIER_1 English(EN) · [email protected] ·

    Pusheen’s first game is coming to Apple Arcade Pusheen is getting her first game, and it will appear exclusively on Apple Arcade. Launching October 1st, Pusheen

    Pusheen’s first game is coming to Apple Arcade Pusheen is getting her first game, and it will appear exclusively on Apple Arcade. Launching October 1st, Pusheen's Place lets you collect and care for more than 100 Pusheens as you play minigames and decorate rooms for… https://www.…

    LINKS theverge.com/…/pusheen-apple-arcade-game
  3. Mastodon — mastodon.social TIER_1 English(EN) · [email protected] ·

    TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use TSMC discloses plans to use High-NA EUV lithography in 2030

    TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use TSMC discloses plans to use High-NA EUV lithography in 2030, 6×12-inch photomasks with new scanners in 2033. https://www. tomshardware.com/tech-industry /semiconductors/tsmc-to-st…

    LINKS tomshardware.com/…/tsmc-to-start-using-hi… tomshardware.com/tech-industry

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