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China's EUV lithography tech lags ASML's 2004 level, analyst says

An analyst from UBS has stated that China's advanced lithography technology is currently comparable to ASML's capabilities in 2004. While Chinese companies like ACM Research, AMEC, and Naura have made progress in other semiconductor manufacturing tools, they have not yet developed competitive lithography machines for modern chip production. Shanghai Micro Electronics Equipment (SMEE) has reportedly introduced an immersion DUV lithography system capable of 28nm nodes, but there is no evidence of its mass production or adoption by chipmakers, indicating China's semiconductor industry still lags behind Western rivals. AI

IMPACT Lagging lithography capabilities in China could slow its domestic AI hardware development and reliance on foreign technology.

RANK_REASON Analysis of a nation's technological progress in a critical industry sector. [lever_c_demoted from significant: ic=1 ai=0.7]

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China's EUV lithography tech lags ASML's 2004 level, analyst says

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Analysis of a nation's technological progress in a critical industry sector. [lever_c_demoted from significant: ic=1 ai=0.7]
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COVERAGE [1]

  1. Tom's Hardware TIER_1 English(EN) · Anton Shilov ·

    China's EUV technology 'at a similar stage to ASML in 2004,' analyst claims — Beijing's semiconductor industry remains well behind Western rivals

    Despite rumors, there is no evidence that Chinese makers of lithography tools can produce immersion lithography scanners in quantity.