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ENTITY Mo/Si multilayer optics for micro-lithography

Mo/Si multilayer optics for micro-lithography

PulseAugur coverage of Mo/Si multilayer optics for micro-lithography — every cluster mentioning Mo/Si multilayer optics for micro-lithography across labs, papers, and developer communities, ranked by signal.

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  1. TOOL · CL_247822 ·

    New EUV Lithography System Promises Higher Throughput and Sub-10nm Feature Resolution

    Researchers have developed a novel two-mirror projection system for extreme ultraviolet (EUV) lithography, capable of achieving a 4x demagnification at wavelengths of 13.5 nm and 11.2 nm. This design significantly impro…