ENTITY Bragg

Bragg

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TOOL · CL_247822 · Sep 11 · 04:00

New EUV Lithography System Promises Higher Throughput and Sub-10nm Feature Resolution

Researchers have developed a novel two-mirror projection system for extreme ultraviolet (EUV) lithography, capable of achieving a 4x demagnification at wavelengths of 13.5 nm and 11.2 nm. This design significantly impro…