Researchers have developed a novel global-in-time spectral Duhamel-Picard method for simulating post-exposure bake (PEB) processes in extreme ultraviolet lithography. This method reformulates the reaction-diffusion equations as nonlinear Volterra integral equations, using polynomial expansions to represent full trajectories and determining coefficients via accelerated Picard iteration, thus avoiding sequential time marching. The approach has demonstrated the ability to simulate large 3D domains efficiently, completing simulations of $1200\times1200\times100$ voxels in approximately one minute. Furthermore, this formulation has been integrated into a physics-informed neural operator (PINO) using a factorized Fourier neural operator, enabling time-marching-free prediction of concentration fields at any point within the bake interval without requiring precomputed solutions. AI
IMPACT Accelerates simulation times for critical semiconductor manufacturing processes, potentially speeding up chip design and production cycles.
RANK_REASON The cluster contains a research paper detailing a new computational method for a specific scientific application. [lever_c_demoted from research: ic=1 ai=1.0]
- arXiv
- Duhamel-Picard method
- Duhamel principle
- extreme ultraviolet lithography
- factorized Fourier neural operator
- Physics-Informed Neural Operator
- Picard iteration
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