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New SAMSEM approach adapts SAM2 for IC metal line segmentation

By PulseAugur Editorial · [1 sources] ·

Researchers have developed SAMSEM, a novel approach for segmenting metal lines in integrated circuit (IC) images, adapting Meta's Segment Anything Model 2 (SAM2). This method utilizes a multi-scale segmentation strategy and incorporates topology-based losses alongside pixel-based ones to focus on electrical connectivity. SAMSEM demonstrates strong generalization capabilities across various ICs, technology nodes, and manufacturing processes, achieving low error rates even on unseen data. AI

IMPACT Enhances hardware security and verification by improving the accuracy and generalizability of IC metal line segmentation.

RANK_REASON This is a research paper detailing a new method for IC metal line segmentation using an adapted foundation model. [lever_c_demoted from research: ic=1 ai=1.0]

Read on arXiv cs.CV →

AI-generated summary · Google Gemini · from 1 sources. How we write summaries →

New SAMSEM approach adapts SAM2 for IC metal line segmentation

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This is a research paper detailing a new method for IC metal line segmentation using an adapted foundation model. [lever_c_demoted from research: ic=1 ai=1.0]
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COVERAGE [1]

  1. arXiv cs.CV TIER_1 English(EN) · Christian Gehrmann, Jonas Ricker, Simon Damm, Deruo Cheng, Julian Speith, Yiqiong Shi, Asja Fischer, Christof Paar ·

    SAMSEM -- A Generic and Scalable Approach for IC Metal Line Segmentation

    arXiv:2603.16548v2 Announce Type: replace-cross Abstract: In light of globalized hardware supply chains, the assurance of hardware components has gained significant interest, particularly in cryptographic applications and high-stakes scenarios. Identifying metal lines on scanning…

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