Chinese startup claims photonic chip production without DUV lithography, says nanoimprint process cuts costs by 90% — 8-inch wafers produced without conventional optical lithography
Chinese startup Prinano has announced a breakthrough in photonic chip production, utilizing a novel nanoimprint lithography (NIL) process. This method bypasses the need for expensive deep-ultraviolet (DUV) lithography equipment, potentially reducing manufacturing costs by up to 90%. The company has successfully produced 8-inch photonic chip wafers, a significant development that could help China circumvent US export restrictions on advanced semiconductor technology. AI
IMPACT This advancement in photonic chip manufacturing could enable more cost-effective and accessible components for AI hardware, potentially bypassing current geopolitical supply chain constraints.